Patterned Test Wafer (Patterned wafer)

Patterned Test Wafer (Patterned wafer)

Semiconductor chip and device has reached to extreme level of industrial use, health science and other application. The world of semiconductor is becoming very dynamic and never ending technology is coming out day by day. Here, Advantec support for the varieties of pattern wafers by using multiple tools masks that fits to the application. 

• Line & Space, Contact Hole
• I-Line, KrF, ArF, ArF immersion
• CMP TEST (Cu, W, STI, ILD etc.) - 754, 854, 454Mask, etc., Various Novati Mask compatible types
• Plasma Damage TEG

• Corresponds to the minimum line width of 32 nm and is available from mask production.
• Required meeting. Please contact us for more information.

Pattern Wafer Products

• Cu CMP evaluation wafers
• W CMP evaluation wafers
• Wafer for STI CMP evaluation
• TSV (Through Silicon Via) wafer
• Deep Si Etch (50 um) via wafer
• Double Patterning wafer

Cu CMP Evaluation wafers	size	300mm
	Construction	Anneal / Cu EP 7KA Fill / Cu seed 1K / TaN 250A / Etch 3K (100nm Trench) / TEOS 3K / Si

• Specifications other than the above are also available. Please specify the specification of your choice.